Coating Systems - ≡ Plasmadiam® - Swiss Vacuum Solutions

Coating Systems

Discover our solutions

Discover our solutions

S800

Compact hard PVD
Functional Coating

General Information

Technology : Arc
Dimensions : W3400 x D3000 x H2300 mm
Vacuum chamber size : W800 x D800 x H1,150 mm
Vacuum chamber capacity : 730 l
Using plasma volume : D=550 x H720
Target : 727×178×18 mm (3Set) - 200/400/400A
Turntable : D436 × H727 mm
Power : 3×400V/120 kW
Software : Industrial PC system Simple and easy diagnosis and description system Remote diagnosis through data machine or IP

Coating types

Standards Coating : TiN, CrN, TiCN, TiAlN, AlTiN, etc.
Recipes can be selected : AlCrN, TiAlSiN, AlCrTiN, DLC, etc.
Capacity (24H)
Milling cutter : D6×50 mm = 1,800×5 = 9,000 pces - D16×95 mm = 450×5= 2,250 pces
Insert : D20×H6 mm = 2,340×5 = 11,700 pces
Hobs : D80×180 mm =24×5= 120 pces

BT150-300

HHV Bench Top Sputter Coaters

New bench-top deposition tools for EM sample prep and R&D
Touch screen control system for automatic sample coating
Wide range of sample stages
Integrated film thickness monitoring
Easy target change

Process options

Metals sputtering for SEM
Carbon fibre evaporation for TEM
Carbon rod evaporation for TEM
Resistance evaporation
Glow discharge
Water-cooled SEM stage with bias function
Rotary stages for SEM stubs
Rotary stages for wafer substrates
Integrated film thickness monitor

Control features

Vacuum Coating System

Auto 306

Auto306 is available with glass bell jar and glass cylinder chamber options. Also available is the versatile FL400 front-loading box chamber which provides additional height and width for the fitting of extra process accessories.

Features and Benefits

Touch screen PLC control of vacuum
Choice of deposition sources and power supplies
Range of work holders
Range of vacuum chambers ta suit applications
Intelligent high vacuum valve protects pumps and samples
Compact unit minimises space requirements
No compressed air required
Fully interlocked for operator safety

Box Coating Systems

ATS500

Resistance evaporation sources
Electron beam sources for high-rate evaporation and lift-off processes
lon-beam assistance for optical applications or substrate cleaning
Combination systems featuring two or more of the above
Temperature controlled evaporation sources for OLED and organic photovoltaic applications

Features and Benefits